none
碩士 === 國立中央大學 === 光電科學研究所 === 90 === Abstract We have deposited Ta2O5 and SiO2 films by ion-beam sputtering. By measuring Ta2O5 and SiO2 films, we find that thin films deposited by ion-beam sputtering have several advantages. 1.High packing density. 2.Refractive index steady. 3.Low scattering loss....
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2002
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/81693703786751476275 |
| id |
ndltd-TW-090NCU05614008 |
|---|---|
| record_format |
oai_dc |
| spelling |
ndltd-TW-090NCU056140082015-10-13T10:12:40Z http://ndltd.ncl.edu.tw/handle/81693703786751476275 none 離子濺鍍膜厚均勻性之研究 Huang-Ping Chiu 邱煥評 碩士 國立中央大學 光電科學研究所 90 Abstract We have deposited Ta2O5 and SiO2 films by ion-beam sputtering. By measuring Ta2O5 and SiO2 films, we find that thin films deposited by ion-beam sputtering have several advantages. 1.High packing density. 2.Refractive index steady. 3.Low scattering loss. 4.Low absorption loss. 5.Amorphous. Based on these advantages, we establish the method to describe and analyze thickness distribution. We use a concept that the density distribution of ion beam projecting on target to simulate actual thickness distribution. In simulation process, we divide the projecting surface source of target to many uniform emissive sources. A correct thickness distribution by using the concept has been successfully described. Cheng-Chung Lee 李正中 2002 學位論文 ; thesis 48 zh-TW |
| collection |
NDLTD |
| language |
zh-TW |
| format |
Others
|
| sources |
NDLTD |
| description |
碩士 === 國立中央大學 === 光電科學研究所 === 90 === Abstract
We have deposited Ta2O5 and SiO2 films by ion-beam sputtering. By measuring Ta2O5 and SiO2 films, we find that thin films deposited by ion-beam sputtering have several advantages.
1.High packing density.
2.Refractive index steady.
3.Low scattering loss.
4.Low absorption loss.
5.Amorphous.
Based on these advantages, we establish the method to describe and analyze thickness distribution. We use a concept that the density distribution of ion beam projecting on target to simulate actual thickness distribution. In simulation process, we divide the projecting surface source of target to many uniform emissive sources. A correct thickness distribution by using the concept has been successfully described.
|
| author2 |
Cheng-Chung Lee |
| author_facet |
Cheng-Chung Lee Huang-Ping Chiu 邱煥評 |
| author |
Huang-Ping Chiu 邱煥評 |
| spellingShingle |
Huang-Ping Chiu 邱煥評 none |
| author_sort |
Huang-Ping Chiu |
| title |
none |
| title_short |
none |
| title_full |
none |
| title_fullStr |
none |
| title_full_unstemmed |
none |
| title_sort |
none |
| publishDate |
2002 |
| url |
http://ndltd.ncl.edu.tw/handle/81693703786751476275 |
| work_keys_str_mv |
AT huangpingchiu none AT qiūhuànpíng none AT huangpingchiu lízijiàndùmóhòujūnyúnxìngzhīyánjiū AT qiūhuànpíng lízijiàndùmóhòujūnyúnxìngzhīyánjiū |
| _version_ |
1716827360565657600 |