Study on low-k barrier dielectric
碩士 === 國立交通大學 === 電子工程系 === 90 === In the era of deep submicron semiconductor fabrication, interconnect resistance-capacitance (RC) delay dominates the performance of whole integrated circuits (ICs). To mitigate the issue, two realistic methods are accepted popularly. The first method is...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2002
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| Online Access: | http://ndltd.ncl.edu.tw/handle/84465799006928648859 |