Real Time Defect Monitoring & Dynamic Feedback Control System - - Applied in Photo Mask Industry

• Main Authors: Yue-Ching Jin, 金育慶
• Other Authors: Han-Jon Liu
• Format: Others
• Language: zh-TW
• Published: 2002
• Online Access: http://ndltd.ncl.edu.tw/handle/e5g794

碩士 === 國立成功大學 === 高階管理碩士在職專班 === 90 === 　　This thesis presents a photomask defect real time monitoring and feed back control system to detect and analyze the defect status. By means of this system, the defect count will be controlled and decreased. Meanwhile, the mask’s yield will be improved and the manufacturing cost will be lowered. First of all, this thesis analyzes the defect type and the defect impact to the mask. Next, this thesis discusses the factors which induce the defect on the mask. Finally, the thesis propose a system with 6 modules to provide the essential functions. The 6 modules are : 1. Mask SPC System 2. Blank Analysis System 3. Defect Source Analysis 4. Operator Analysis 5. Mask Tooling Failure Mode Element Analysis. 6. Mask Repair Cost and Cycle Time Control System. The “Mask SPC System” will monitor the products defect count status, and other system will be able to find the advanced possible root cause of the defect. Thus, this system will enhance the product’s yield, lower the mask tooling cost and shorten the mask tooling cycle time and then to build the stronger competition for the mask enterprise.