Real Time Defect Monitoring & Dynamic Feedback Control System - - Applied in Photo Mask Industry
碩士 === 國立成功大學 === 高階管理碩士在職專班 === 90 === This thesis presents a photomask defect real time monitoring and feed back control system to detect and analyze the defect status. By means of this system, the defect count will be controlled and decreased. Meanwhile, the mask’s yield will be improved and th...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2002
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| Online Access: | http://ndltd.ncl.edu.tw/handle/e5g794 |