A Study of the Microstructure and Electric Properties of SiNx Thin Films Deposited by Dual Ion Beam Sputtering

A Study of the Microstructure and Electric Properties of SiNx Thin Films Deposited by Dual Ion Beam Sputtering

碩士 === 國立中興大學 === 材料工程學研究所 === 90 === Abstract This research is to investigate the microstructure, chemical composition, electric properties and residual stress of DIBS deposited Silicon Nitride film. The microstructure and chemical composition of the films were analyzed by a...

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Bibliographic Details
Main Authors:	QUAN -LIN- CHEN, 陳冠霖
Other Authors:	F. S. Shieu
Format:	Others
Language:	zh-TW
Published:	2002
Online Access:	http://ndltd.ncl.edu.tw/handle/85086316126605848351

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