Etching Properties of INVAR Plates

• Main Authors: Dayu Lin, 林大裕
• Other Authors: Hong-Ming Lin
• Format: Others
• Language: zh-TW
• Published: 2001
• Online Access: http://ndltd.ncl.edu.tw/handle/00780267729034473058

碩士 === 大同大學 === 材料工程研究所 === 89 === INVAR material, which possesses quite low thermal expansion coefficient, can be used to shadow mask of HDTV. Because of its small thermal deformation, invar can achieve the requirement of high resolution in HDTV.In previous study, four kinds of invar plats( Imphy (0.12mm), YET36A6790 51AA (0.10mm), YET36A7770 53B (0.13mm) 及YET36A7674 53A-1C(0.12mm)) which are provided by ITRI have been examined their compositions, microstructures, magnetic and mechanical properties. The invar with Fe-37wt%Ni composition that make by ITRI is used to evaluate the effect of the microstructure and crystal orientation on the etching factors. The results indicate there is no strong effect of the crystal orientation to be observed in etching behavior. This might cause by the flatness of invar plate that affect the etching process.