The feasible evaluation of CMP wastewater reclaim from Semiconductor Plants reclamation

碩士 === 國立臺灣大學 === 環境工程學研究所 === 89 === Recently due to the imposed regulations of government, all of the semi-conductor plants have been required to reduce raw water usage. Hence, it is utmost important to treat, reclaim and reuse wastewater. One of the established targets is the usage of wastewater...

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Main Authors: Lo, Chin-Sheng, 羅金生
Other Authors: 駱尚廉
Format: Others
Language:zh-TW
Published: 2001
Online Access:http://ndltd.ncl.edu.tw/handle/60443407025617807343
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spelling ndltd-TW-089NTU005150132016-07-04T04:17:15Z http://ndltd.ncl.edu.tw/handle/60443407025617807343 The feasible evaluation of CMP wastewater reclaim from Semiconductor Plants reclamation 半導體廠化學機械研磨(CMP)廢水回收再利用可行性評估 Lo, Chin-Sheng 羅金生 碩士 國立臺灣大學 環境工程學研究所 89 Recently due to the imposed regulations of government, all of the semi-conductor plants have been required to reduce raw water usage. Hence, it is utmost important to treat, reclaim and reuse wastewater. One of the established targets is the usage of wastewater from Chemical Mechanical Polishing(CMP)process, which spends a huge of water supply and causes high pollution under the production process and was virtually ignored by the complexity of dealing with the CMP waste during the past. The CMP wastewater is complicated as its various treatment processes to use many kinds of chemicals, it also uses large quantity of ultra pure water(UPW)to rinse wafer after CMP slurry treatment. It will lead to the problem of environmental pollution and water resource wasted if the rinse water is not properly treated and reclaimed. Currently most of the semi-conductor plants adopt a conventional chemical coagulation and sedimentation process to treat CMP wastewater. This treatment consumes a large guantity of coagulants and its optimum pH operation range is considerably narrow, not only makes sludge but hard to operate, it will be more difficult because the instability due to the character of the slurry abrasive of CMP wastewater and the whole CMP process had been changed. The purpose of this research is to establish a pilot plant which involves chemical pretreatment, ceramic membrane microfiltration, carbon filtration and reverse osmosis system as a combination process to treat the CMP wastewater, and in order to reach the goal of reclaiming water quality. Taking advantage of sampling the actual water manufacturing CMP process waste including oxide and metal CMP being treated through the pilot plant. The results of the pilot test will demonstrate the viability of the treatment scheme and provide effective data for scale-up calculations; then establish operating data to count the cost / per ton of CMP wastewater reclaiming and thus analyze on flow rates as well as to conventional chemical coagulation and sedimentation process. 駱尚廉 2001 學位論文 ; thesis 96 zh-TW
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language zh-TW
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sources NDLTD
description 碩士 === 國立臺灣大學 === 環境工程學研究所 === 89 === Recently due to the imposed regulations of government, all of the semi-conductor plants have been required to reduce raw water usage. Hence, it is utmost important to treat, reclaim and reuse wastewater. One of the established targets is the usage of wastewater from Chemical Mechanical Polishing(CMP)process, which spends a huge of water supply and causes high pollution under the production process and was virtually ignored by the complexity of dealing with the CMP waste during the past. The CMP wastewater is complicated as its various treatment processes to use many kinds of chemicals, it also uses large quantity of ultra pure water(UPW)to rinse wafer after CMP slurry treatment. It will lead to the problem of environmental pollution and water resource wasted if the rinse water is not properly treated and reclaimed. Currently most of the semi-conductor plants adopt a conventional chemical coagulation and sedimentation process to treat CMP wastewater. This treatment consumes a large guantity of coagulants and its optimum pH operation range is considerably narrow, not only makes sludge but hard to operate, it will be more difficult because the instability due to the character of the slurry abrasive of CMP wastewater and the whole CMP process had been changed. The purpose of this research is to establish a pilot plant which involves chemical pretreatment, ceramic membrane microfiltration, carbon filtration and reverse osmosis system as a combination process to treat the CMP wastewater, and in order to reach the goal of reclaiming water quality. Taking advantage of sampling the actual water manufacturing CMP process waste including oxide and metal CMP being treated through the pilot plant. The results of the pilot test will demonstrate the viability of the treatment scheme and provide effective data for scale-up calculations; then establish operating data to count the cost / per ton of CMP wastewater reclaiming and thus analyze on flow rates as well as to conventional chemical coagulation and sedimentation process.
author2 駱尚廉
author_facet 駱尚廉
Lo, Chin-Sheng
羅金生
author Lo, Chin-Sheng
羅金生
spellingShingle Lo, Chin-Sheng
羅金生
The feasible evaluation of CMP wastewater reclaim from Semiconductor Plants reclamation
author_sort Lo, Chin-Sheng
title The feasible evaluation of CMP wastewater reclaim from Semiconductor Plants reclamation
title_short The feasible evaluation of CMP wastewater reclaim from Semiconductor Plants reclamation
title_full The feasible evaluation of CMP wastewater reclaim from Semiconductor Plants reclamation
title_fullStr The feasible evaluation of CMP wastewater reclaim from Semiconductor Plants reclamation
title_full_unstemmed The feasible evaluation of CMP wastewater reclaim from Semiconductor Plants reclamation
title_sort feasible evaluation of cmp wastewater reclaim from semiconductor plants reclamation
publishDate 2001
url http://ndltd.ncl.edu.tw/handle/60443407025617807343
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