Characteristics of SRS QMS-300 in exhaust monitoring with application to WCVD process
碩士 === 國立高雄第一科技大學 === 環境與安全衛生工程系 === 89 === Abstract This study is to monitor the exhaust produced during the semiconductor manufacturing process. The method used in this study is the Stanford Research System(SRS) QMS-300. QMS-300 uses a capillary and an aperture to reduce the pressure of...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2001
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| Online Access: | http://ndltd.ncl.edu.tw/handle/47208833949320239789 |