Particle Simulaiton of a Silicon Deposition in LPCVD
碩士 === 國立交通大學 === 機械工程系 === 89 === Particle simulation of silicon Chemical Vapor Deposition (CVD) process is proposed using the Direct Simulation Monte Carlo (DSMC) method. Conservative weighting scheme [Boyd, 1996] is used to deal with the trace species often involved in CVD, which is ot...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2001
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| Online Access: | http://ndltd.ncl.edu.tw/handle/19348290410739636605 |