Hotelling T2 Control Chart for Defects in IC Fabrication using Cluster Index

碩士 === 國立交通大學 === 工業工程與管理系 === 89 === For the integrated circuits (IC) manufacturer, the clustering of defects on a wafer due to the complicated manufacturing process becomes more evident with increased wafer size. The defect clustering phenomenon causes the Possion based c-chart invalid. Many modif...

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Main Authors: Chih Li Huang, 黃志力
Other Authors: Lee-Ing Tong
Format: Others
Language:zh-TW
Published: 2001
Online Access:http://ndltd.ncl.edu.tw/handle/99929680432663330493
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spelling ndltd-TW-089NCTU00310332016-01-29T04:27:57Z http://ndltd.ncl.edu.tw/handle/99929680432663330493 Hotelling T2 Control Chart for Defects in IC Fabrication using Cluster Index 積體電路生產線上結合缺陷數與群聚指標之HotellingT2多變量管制圖 Chih Li Huang 黃志力 碩士 國立交通大學 工業工程與管理系 89 For the integrated circuits (IC) manufacturer, the clustering of defects on a wafer due to the complicated manufacturing process becomes more evident with increased wafer size. The defect clustering phenomenon causes the Possion based c-chart invalid. Many modified control charts has been developed to reduce the false alarms caused by defect clustering problem. However, there are still some actions in employing these control charts. This study proposed a statistical process control method for monitoring wafer defect with clustering phenomenon. The method employs Hotelling T2 control chart using the combination of defect counts and cluster index as a modified measurement index for wafer defect with clustering. A case study is also presented, the results indicate that the proposed method is more effective than that of previous studies. Lee-Ing Tong 唐麗英 2001 學位論文 ; thesis 28 zh-TW
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language zh-TW
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sources NDLTD
description 碩士 === 國立交通大學 === 工業工程與管理系 === 89 === For the integrated circuits (IC) manufacturer, the clustering of defects on a wafer due to the complicated manufacturing process becomes more evident with increased wafer size. The defect clustering phenomenon causes the Possion based c-chart invalid. Many modified control charts has been developed to reduce the false alarms caused by defect clustering problem. However, there are still some actions in employing these control charts. This study proposed a statistical process control method for monitoring wafer defect with clustering phenomenon. The method employs Hotelling T2 control chart using the combination of defect counts and cluster index as a modified measurement index for wafer defect with clustering. A case study is also presented, the results indicate that the proposed method is more effective than that of previous studies.
author2 Lee-Ing Tong
author_facet Lee-Ing Tong
Chih Li Huang
黃志力
author Chih Li Huang
黃志力
spellingShingle Chih Li Huang
黃志力
Hotelling T2 Control Chart for Defects in IC Fabrication using Cluster Index
author_sort Chih Li Huang
title Hotelling T2 Control Chart for Defects in IC Fabrication using Cluster Index
title_short Hotelling T2 Control Chart for Defects in IC Fabrication using Cluster Index
title_full Hotelling T2 Control Chart for Defects in IC Fabrication using Cluster Index
title_fullStr Hotelling T2 Control Chart for Defects in IC Fabrication using Cluster Index
title_full_unstemmed Hotelling T2 Control Chart for Defects in IC Fabrication using Cluster Index
title_sort hotelling t2 control chart for defects in ic fabrication using cluster index
publishDate 2001
url http://ndltd.ncl.edu.tw/handle/99929680432663330493
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