| Summary: | 碩士 === 國立成功大學 === 化學工程學系 === 89 === 英文摘要(Abstract)
The industrial demands for high precision mold processing have increased gradually. Since the molds were gradually wore out during processing, the heat treatment and the electro-plating for hardening the mold surface are no longer sufficient. The serious abrasion induced lower efficiency and less precision. Among all industries, the molding precision is highly demanded in optoelectronic and semiconductor industries. For practical applications, the mold needs to be abrasion-resistant as well as with special performance including low surface energy, low roughness and characteristic colors.
An inductively-coupled plasma unbalance magnetron sputtering system is employed in this study for the generation of high-density plasma. The films of low surface energy and low surface roughness are deposited. The adhesion between the DLC film and substrate is also enhanced by interfacial buffer layers between the DLC film and the substrate.
Abrasion-resistance and adhesion have been successfully enhanced by applying the concept of gradient layer processes. So the thin film deposited on the SKD11 steel can achieve a critical load of 88N and a low friction coefficient of 0.07. However, HMDSO precursor and CrNxCy gradient layers are also employed to regulate color of the film by adjusting the deposition parameters. This study has already developed well-adhesive and multi-functional films.
Structural analysis shows that the film deposited is made of nano-composite material containing nano-particles with sizes about 20~30nm. When the substrate temperature and the ICP power were increased, the crystal properties became better. The HMDSO films had hardness of 2750Hv. The relationship between microstructure and physical properties of the multi-functional films is also discussed.
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