CoTiO3 High-k Dielectric for Nonvolatile Memory
碩士 === 國立中興大學 === 電機工程學系 === 89 === In this thesis, for the first time we have fabricated CoTiO3 high-k material as the interpoly dielectrics for nonvolatile memory application. We found that the dielectric constant with the barrier layer can be reached as high as 40. CoTiO3 thin film were thermally...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2001
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| Online Access: | http://ndltd.ncl.edu.tw/handle/06246768756251195759 |