X-ray微影光罩變形因素探討
碩士 === 中華大學 === 機械與航太工程研究所 === 89 === The X-ray mask will produce in-plane distortion (IPD) and out-of-plane distortion (OPD) in X-ray lithography and fabrication processes. In this thesis, the finite element modeling and analysis procedures were developed in ANSYS environment to verify...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2001
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| Online Access: | http://ndltd.ncl.edu.tw/handle/79950856976253856982 |