The study of silicide on reduction of sheet resistance

碩士 === 中華大學 === 電機工程學系碩士班 === 89 === The performance of MOSFET makes a lot of progress as the technology of ULSI driven to smaller and smaller scale. However, The interconnection limits the operation frequency due to its high resistance. How to improve the characteristics of interconnection is an im...

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Bibliographic Details
Main Authors: Y. C. Chen, 陳盈吉
Other Authors: I. J. Hsieh
Format: Others
Language:zh-TW
Published: 2001
Online Access:http://ndltd.ncl.edu.tw/handle/48814746399345512667