A Study of the Films for the Cold Cathode of Field Emission Display

• Main Authors: Ming-Feng Yu, 余明峰
• Other Authors: Jyi-Tsong Lo
• Format: Others
• Language: en_US
• Published: 2000
• Online Access: http://ndltd.ncl.edu.tw/handle/15996521820609527439

碩士 === 大同大學 === 光電工程研究所 === 88 === Field emission display (FED) is a kind of flat panel display (FPD), which has attracted much attention in recent year due to its excellent properties, such as low operation voltage, high emission current, high image quality and wide viewing angle etc. The structure of FED includes two parts: the field emission array (FEA), and the phosphor screen. In order to realize the low-voltage operation and enhance emission stability, we try the reactive sputtering to deposit various kinds of carbon films on the Si substrate and the knife-edge-like carbon film shows better field emission characteristic. The threshold electric field for the knife-edge-like carbon film cathode was as low as 2.77 V/μm and the emission current reached 8.0×10-5 A/cm2. Then we deposit the knife-edge-like carbon film on Al/glass substrate in order to increase the FED area and improve the adhesion. Its threshold electric field was 5.07 V/μm and the emission current reached 4.19×10-5 A/cm2.