STUDIES ON THE CHARACTERISTICS OF OLIGOMERIC ANILINE METAL OXIDE SEMICONDUCTOR FIELD-EFFECT TRANSISTOR

碩士 === 大同大學 === 化學工程研究所 === 88 === ABSTRACT In this study, the oligomeric aniline, which contained benzidine unit, synthesized chemically and its structure and characteristics are confirmed by FT-IR, FAB-MS, EA and NMR. The characteristics of metal-oxide-semiconductor field...

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Main Authors: Duen-Jye Yang, 楊惇傑
Other Authors: Chin-Tsou Kuo
Format: Others
Language:zh-TW
Published: 2000
Online Access:http://ndltd.ncl.edu.tw/handle/92724506017795520394
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spelling ndltd-TW-088TTU000630052016-01-29T04:19:20Z http://ndltd.ncl.edu.tw/handle/92724506017795520394 STUDIES ON THE CHARACTERISTICS OF OLIGOMERIC ANILINE METAL OXIDE SEMICONDUCTOR FIELD-EFFECT TRANSISTOR 寡苯胺金氧半場效電晶體的特性探討 Duen-Jye Yang 楊惇傑 碩士 大同大學 化學工程研究所 88 ABSTRACT In this study, the oligomeric aniline, which contained benzidine unit, synthesized chemically and its structure and characteristics are confirmed by FT-IR, FAB-MS, EA and NMR. The characteristics of metal-oxide-semiconductor field-effect transistors (MOSFETs) fabricated with oligomeric aniline as semiconducting layer by evapotation are investigated. Evaporating temperature, substrate temperature, morphology and the thickness of film and silicon dioxide can influence the characteristics of MOSFETs. The highest mobility and modulation (2.61  10 —2 cm2/V-s and 3.20  10 4) were obtained for transistors prepared at evaporating temperature of 250 oC and substrate temperature of 50 oC. Chin-Tsou Kuo 郭欽湊 2000 學位論文 ; thesis 95 zh-TW
collection NDLTD
language zh-TW
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sources NDLTD
description 碩士 === 大同大學 === 化學工程研究所 === 88 === ABSTRACT In this study, the oligomeric aniline, which contained benzidine unit, synthesized chemically and its structure and characteristics are confirmed by FT-IR, FAB-MS, EA and NMR. The characteristics of metal-oxide-semiconductor field-effect transistors (MOSFETs) fabricated with oligomeric aniline as semiconducting layer by evapotation are investigated. Evaporating temperature, substrate temperature, morphology and the thickness of film and silicon dioxide can influence the characteristics of MOSFETs. The highest mobility and modulation (2.61  10 —2 cm2/V-s and 3.20  10 4) were obtained for transistors prepared at evaporating temperature of 250 oC and substrate temperature of 50 oC.
author2 Chin-Tsou Kuo
author_facet Chin-Tsou Kuo
Duen-Jye Yang
楊惇傑
author Duen-Jye Yang
楊惇傑
spellingShingle Duen-Jye Yang
楊惇傑
STUDIES ON THE CHARACTERISTICS OF OLIGOMERIC ANILINE METAL OXIDE SEMICONDUCTOR FIELD-EFFECT TRANSISTOR
author_sort Duen-Jye Yang
title STUDIES ON THE CHARACTERISTICS OF OLIGOMERIC ANILINE METAL OXIDE SEMICONDUCTOR FIELD-EFFECT TRANSISTOR
title_short STUDIES ON THE CHARACTERISTICS OF OLIGOMERIC ANILINE METAL OXIDE SEMICONDUCTOR FIELD-EFFECT TRANSISTOR
title_full STUDIES ON THE CHARACTERISTICS OF OLIGOMERIC ANILINE METAL OXIDE SEMICONDUCTOR FIELD-EFFECT TRANSISTOR
title_fullStr STUDIES ON THE CHARACTERISTICS OF OLIGOMERIC ANILINE METAL OXIDE SEMICONDUCTOR FIELD-EFFECT TRANSISTOR
title_full_unstemmed STUDIES ON THE CHARACTERISTICS OF OLIGOMERIC ANILINE METAL OXIDE SEMICONDUCTOR FIELD-EFFECT TRANSISTOR
title_sort studies on the characteristics of oligomeric aniline metal oxide semiconductor field-effect transistor
publishDate 2000
url http://ndltd.ncl.edu.tw/handle/92724506017795520394
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