Preparation and characterization of iridium dioxide thin films by metal-organic chemical vapor deposition
碩士 === 國立臺灣科技大學 === 工程技術研究所材料科技學程 === 88 === Iridium dioxide (IrO2) films were deposited on Si substrates by metal-organic chemical vapor deposition method under various conditions. A detailed characterization including X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic f...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2000
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| Online Access: | http://ndltd.ncl.edu.tw/handle/42327916585418577646 |