A Simulation Study on Wafer Temperature in the Rapid Thermal Process
碩士 === 國立臺灣大學 === 機械工程學研究所 === 88 === A Simulation Study on Wafer Temperature in the Rapid Thermal Process In a rapid thermal process, the physical and chemical characteristics of the wafer and the film deposition rate are directly influenced by the temperature distribution on...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2000
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| Online Access: | http://ndltd.ncl.edu.tw/handle/27244606521029004968 |