Effects of Surface Pre-Cleaning and High Temperature Deposition on the Formation of Cobalt Silicides and Growth Kinetics of SiO2 on (001) Si Catalyzed by Cu3Si at Elevated Temperatures
博士 === 國立清華大學 === 材料科學工程學系 === 88 === CoSi2 has been a promising candidate material to replace TiSi2. However, the major issues on Co salicide processes are its sensitivity to surface contamination and oxidation during ex-situ rapid thermal annealing (RTA), which cause poor reproducibility. In the p...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2000
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| Online Access: | http://ndltd.ncl.edu.tw/handle/92696302339979403435 |