Study of E-Beam Proximity Effect and Synthesis of Polyimide as E-Beam Resist
碩士 === 國立清華大學 === 化學工程學系 === 88 === Electron beam (e-beam) lithography is one of the most promising candidates for defining fine patterns smaller than 0.1 mm. One of the most serious in e-beam lithography is the proximity effect caused by electron scattering in the resist and the substrate. To obtai...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2000
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| Online Access: | http://ndltd.ncl.edu.tw/handle/50642349137675079242 |