| Summary: | 碩士 === 國立中山大學 === 光電工程研究所 === 88 === Abstract
The work presented in this thesis is intend to develop the required technologies for fabrication optical interconnection between a single mode fiber (SMF) and a hybrid antiresonant reflection optical waveguide(ARROW). In addition, the coupling characteristic between the SMF and ARROW are theoretically investigated.
The fabrication of the optical interconnection includes three major techniques: fabrication of hybrid ARROW waveguide, V groove formation and U groove deep etching. The ARROW waveguide centered at 1.3mm was fabrication using semiconductor process technologies. Propagation losses of the device as low as 0.6dB/cm for TE polarized and 2.55dB/cm for TM were obtained. Anisotropic etching of Si-V grooves were formed using EDP solution, and room temperature sputtered Ta2O5 was used as the etch mask. At a etching temperature of 1200C, the under cut is 1.6mm. In order to increase the coupling efficiencies, we employed the U groove deep etching to reduce the distance from SMF to ARROW . The trenches with a depth 58mm were etched with SF6/O2 dry etching.
Based on our calculation, the coupling efficiency as high as 90% can be obtained when the hybrid ARROW has a core thickness and a waveguide width of 12mm. The 3-dB alignment tolerance in X and Y directions between the SMF and ARROW are ±3.6mm and±3.7mm respectively.
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