Design and Fabrication of Gray-Scale Masks
碩士 === 國立交通大學 === 光電工程所 === 88 === Conventionally, the diffractive optical elements（DOE’s）are produced with a binary multimask lithography-and-etch fabrication process. To generate a multilevel DOE structure with 2n phase level requires n binary masks, n photolithographic processing steps...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2000
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/53791932178070697866 |