The Study of High-K material La2O3
碩士 === 國立交通大學 === 電子工程系 === 88 === In recent years, there are large amounts of research and development of high K material for the reason of the scaling down and burst improvement of memory technology. The high K technology has reached a colossal success, just like BaSrTiO3 (BST, K=200),...
Main Authors: | J. B. Wang, 王俊彬 |
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Other Authors: | Albert Chin |
Format: | Others |
Language: | en_US |
Published: |
2000
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Online Access: | http://ndltd.ncl.edu.tw/handle/75206457477114214117 |
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