Breakdown Characteristics of Ultra Thin Oxides
碩士 === 國立交通大學 === 電子工程系 === 88 === The reliability of oxide films is an important issue for ultra large scale integrated (ULSI) IC''s, especially as oxide is getting thinner and thinner. It is known for several years that thinner oxides can have anomalous failure mode. However, despite the...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2000
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| Online Access: | http://ndltd.ncl.edu.tw/handle/10014520021989097889 |