Diamond Nucleation on Cu by Using Microwave Plasma Chemical Vapor Deposition with a Biasing Pretreatmeat
碩士 === 國立交通大學 === 材料科學與工程系 === 88 === The application of a biasing pretreatment in microwave plasma chemical vapor deposition(MPCVD) has recently been shown to be an effective method for improving the nucleation density and diamond orientation. The result suggests that biasing pretreatment is a prom...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2000
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| Online Access: | http://ndltd.ncl.edu.tw/handle/18824007517327630922 |