陰離子型高分子界面活性劑之合成與其在化學機械研磨漿之應用
碩士 === 國立成功大學 === 化學工程學系 === 88 === Two water-soluble copolymers were synthesized by opening the epoxide group attached with polysiloxane and polyacrylic backbone. Their colloidal behavior in aqueous solution were studied by surface tension measurement and that change of I1/I3 fluorescence spectrum...
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ndltd-TW-088NCKU00630572015-10-13T10:56:29Z http://ndltd.ncl.edu.tw/handle/67525305274362264481 陰離子型高分子界面活性劑之合成與其在化學機械研磨漿之應用 Chin-Lung Liao 廖金龍 碩士 國立成功大學 化學工程學系 88 Two water-soluble copolymers were synthesized by opening the epoxide group attached with polysiloxane and polyacrylic backbone. Their colloidal behavior in aqueous solution were studied by surface tension measurement and that change of I1/I3 fluorescence spectrum as a function of core and their abilities for dispersing the fumed silica in water were investigated. These copolymers also act as dispersants and their dispersing ability to fumed silica in aqueous solution under different pH value were evaluated by apparent viscosity, Zeta potential and SEM. Finally, the relationships between removal rate, non-uniformity and contact angle were used to interpret the CMP performance. The experimental results show that all of these surfactants in aqueous solution transfer to the air-water interface before the formation of polymer aggregates. The degree of reducing the surface tension in aqueous solution is SHS>CHS. The eases of forming aggregates in aqueous solution is SHS>CHS. It was also found that the conformation of polymer aggregates of these polymeric surfactants in aqueous solution is looser packing of the inner core than the usual surfactants. For fumed silica / water dispersion system, at pH = 10.5±0.1, the CHS shows flocculation at high concentration and the others have better dispersion ability; at pH = 7.0±0.1, the two polymeric surfactants and mixing system (CHS/SHE) show the dispersing ability at low concentration; at pH = 2.0±0.1, only SHE shows the best dispersing ability. The CMP slurries made with CHS and CHS/SHE combination have better CMP performance than the others. P-L KUO 郭炳林 2000 學位論文 ; thesis 70 zh-TW |
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碩士 === 國立成功大學 === 化學工程學系 === 88 === Two water-soluble copolymers were synthesized by opening the epoxide group attached with polysiloxane and polyacrylic backbone. Their colloidal behavior in aqueous solution were studied by surface tension measurement and that change of I1/I3 fluorescence spectrum as a function of core and their abilities for dispersing the fumed silica in water were investigated. These copolymers also act as dispersants and their dispersing ability to fumed silica in aqueous solution under different pH value were evaluated by apparent viscosity, Zeta potential and SEM. Finally, the relationships between removal rate, non-uniformity and contact angle were used to interpret the CMP performance.
The experimental results show that all of these surfactants in aqueous solution transfer to the air-water interface before the formation of polymer aggregates. The degree of reducing the surface tension in aqueous solution is SHS>CHS. The eases of forming aggregates in aqueous solution is SHS>CHS. It was also found that the conformation of polymer aggregates of these polymeric surfactants in aqueous solution is looser packing of the inner core than the usual surfactants.
For fumed silica / water dispersion system, at pH = 10.5±0.1, the CHS shows flocculation at high concentration and the others have better dispersion ability; at pH = 7.0±0.1, the two polymeric surfactants and mixing system (CHS/SHE) show the dispersing ability at low concentration; at pH = 2.0±0.1, only SHE shows the best dispersing ability. The CMP slurries made with CHS and CHS/SHE combination have better CMP performance than the others.
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P-L KUO |
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P-L KUO Chin-Lung Liao 廖金龍 |
author |
Chin-Lung Liao 廖金龍 |
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Chin-Lung Liao 廖金龍 陰離子型高分子界面活性劑之合成與其在化學機械研磨漿之應用 |
author_sort |
Chin-Lung Liao |
title |
陰離子型高分子界面活性劑之合成與其在化學機械研磨漿之應用 |
title_short |
陰離子型高分子界面活性劑之合成與其在化學機械研磨漿之應用 |
title_full |
陰離子型高分子界面活性劑之合成與其在化學機械研磨漿之應用 |
title_fullStr |
陰離子型高分子界面活性劑之合成與其在化學機械研磨漿之應用 |
title_full_unstemmed |
陰離子型高分子界面活性劑之合成與其在化學機械研磨漿之應用 |
title_sort |
陰離子型高分子界面活性劑之合成與其在化學機械研磨漿之應用 |
publishDate |
2000 |
url |
http://ndltd.ncl.edu.tw/handle/67525305274362264481 |
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