Cavitation Erosion Behavior of TiNi Thin Films Deposited by Cathodic Arc Plasma Ion Plating
碩士 === 逢甲大學 === 材料科學學系 === 88 === TiNi intermetallic compound is considered for its pseudoelasticity to the application of cavitation resistance. It is however expensive and motivated the introduction of thin film process. Cathodic arc plasma deposition was used to deposit TiNi films on S...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2000
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| Online Access: | http://ndltd.ncl.edu.tw/handle/55860173335944425053 |