| Summary: | 碩士 === 國立臺灣大學 === 工業工程學研究所 === 87 === Manufacturing processes are subject to small and large special disturbances such as process drifts or shifts. In many cases the causes of disturbances are known, but it is either impossible or too expensive to remove them. In such cases, when the resulting output deviations can be compensated by adjusting the processing recipe, process control techniques such as the run-by-run feedback control scheme will be useful.
In this thesis, we present an integrated run-by-run controller for processes subject to random shifts and drifts. For controlling process drifts, the controller has been designed based on the formulation of Double Exponentially Weighted Moving Average (D-EWMA). By adding the self-tuning (ST) feature into the D-EWMA controller, the resulting STD-EWMA controller is able to controlling random shifts more effectively.
Monte Carlo simulation results validate that our STD-EWMA controller is superior to the current run-by-run process controllers such as the EWMA controller or Predictor-Corrector controller.
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