A Nonlinear Regression Model for Exposure errors in IC Manufacturing Processes

A Nonlinear Regression Model for Exposure errors in IC Manufacturing Processes

碩士 === 國立清華大學 === 統計學研究所 === 87 ===

Bibliographic Details
Main Authors:	Haw-Jyue Luo, 羅皓覺
Other Authors:	Wun-Yi Shu
Format:	Others
Language:	zh-TW
Published:	1999
Online Access:	http://ndltd.ncl.edu.tw/handle/87839629011323846057

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