Direct analysis of deposited thin-film in semiconductor manufacturing process by LA-ICP-MS

碩士 === 國立清華大學 === 原子科學系 === 87 ===

Bibliographic Details
Main Authors: Chien Teng Hsu, 徐健騰
Other Authors: M. H. Yang
Format: Others
Language:zh-TW
Published: 1999
Online Access:http://ndltd.ncl.edu.tw/handle/59173178581050237872
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spelling ndltd-TW-087NTHU02570312016-07-11T04:13:21Z http://ndltd.ncl.edu.tw/handle/59173178581050237872 Direct analysis of deposited thin-film in semiconductor manufacturing process by LA-ICP-MS 利用雷射剝蝕法-感應耦合電漿-質譜儀(LA-ICP-MS)分析半導體製程之沈積薄膜的研究 Chien Teng Hsu 徐健騰 碩士 國立清華大學 原子科學系 87 M. H. Yang 楊末雄 1999 學位論文 ; thesis 110 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立清華大學 === 原子科學系 === 87 ===
author2 M. H. Yang
author_facet M. H. Yang
Chien Teng Hsu
徐健騰
author Chien Teng Hsu
徐健騰
spellingShingle Chien Teng Hsu
徐健騰
Direct analysis of deposited thin-film in semiconductor manufacturing process by LA-ICP-MS
author_sort Chien Teng Hsu
title Direct analysis of deposited thin-film in semiconductor manufacturing process by LA-ICP-MS
title_short Direct analysis of deposited thin-film in semiconductor manufacturing process by LA-ICP-MS
title_full Direct analysis of deposited thin-film in semiconductor manufacturing process by LA-ICP-MS
title_fullStr Direct analysis of deposited thin-film in semiconductor manufacturing process by LA-ICP-MS
title_full_unstemmed Direct analysis of deposited thin-film in semiconductor manufacturing process by LA-ICP-MS
title_sort direct analysis of deposited thin-film in semiconductor manufacturing process by la-icp-ms
publishDate 1999
url http://ndltd.ncl.edu.tw/handle/59173178581050237872
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