Study on the field emission properties of nitrogen doped diamond films prepared by microwave plasma enhanced CVD

碩士 === 國立清華大學 === 材料科學工程學系 === 87 === In this paper,we use MPECVD to deposit diamond films on silicon and gold substrate,mixed with methane, hydrogen and urea.We use SEM, four point probes, Raman, FTIR, field emission J-E measurement to realize the thin film properties and try to find ou...

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Bibliographic Details
Main Authors: Chuan-feng Shih, 施權峰
Other Authors: Kuo-Shung Liu
Format: Others
Language:zh-TW
Published: 1999
Online Access:http://ndltd.ncl.edu.tw/handle/60581946929114321378