Growth Characteristics and Properties of Ti-Si-C-N Coating by Chemical Vapor Deposition
碩士 === 國立東華大學 === 材料科學與工程研究所 === 87 === A complex four-component Ti-Si-C-N system was deposited by the chemical vapor deposition (CVD). Hardness of the Ti-Si-C-N coating was higher than 1,800 kgf/mm2 under the experimental conditions, with a maximum value of 2,800 kgf/mm2. To exploit the Ti-Si-C-N...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1999
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| Online Access: | http://ndltd.ncl.edu.tw/handle/56313174887882087842 |