垂直異向性磁光薄膜之毫微米鑄形磁區之製備與分析

• Main Authors: Ying-Wen, Huang, 黃瀛文
• Other Authors: 吳仲卿
• Format: Others
• Language: zh-TW
• Published: 1999
• Online Access: http://ndltd.ncl.edu.tw/handle/56613964121010066424

碩士 === 國立彰化師範大學 === 物理系 === 87 === Artificially patterned magnetic domains have been fabricated in the perpendicular anisotropy magneto-optical (MO) thin film media. Using the techniques of standard electron beam lithography and photolithography in conjunction with lift-off process and reactive ion etch, a variety of hole arrays were made on the silicon nitride coated silicon wafer. Amorphous DyFeCo and Co/Pt multilayers were then deposited over the hole arrays by using sputtering and Molecular beam epitaxy techniques, respectively. The magnetic domain pinning behaviors were studied by applying an external magnetic field perpendicular or in-plan to the film plane. A polar Kerr microscope was used in situ to monitor the magnetic wall motion and a magnetic force microscope was employed to scan the magnetic domain structures. Magnetic domains were found to be pinned inside the hole arrays and reproduced the shapes of the holes. Moreover, the coercivity inside the hole sites is different from nonpatterned region.