Thermal fixing of volume holograms in LiNbO3 crystals
碩士 === 國立交通大學 === 光電工程所 === 87 === In this thesis, we investigate the thermal fixing techniques of volume holographic storage in LiNbO3 crystals. We have performed theoretical modeling, computer simulations, and optical experiments. First, we incorporate ionic transport equations into the Kukhtarev&...
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ndltd-TW-087NCTU06140122016-07-11T04:13:50Z http://ndltd.ncl.edu.tw/handle/66208617464538753948 Thermal fixing of volume holograms in LiNbO3 crystals 鈮酸鋰晶體全像儲存熱定影技術之研究 Chao-Ray Hsieh 謝兆瑞 碩士 國立交通大學 光電工程所 87 In this thesis, we investigate the thermal fixing techniques of volume holographic storage in LiNbO3 crystals. We have performed theoretical modeling, computer simulations, and optical experiments. First, we incorporate ionic transport equations into the Kukhtarev''s equations for photorefractive crystals. Then by using the linear approximation method, we have developed a theoretical model for thermal fixing under both short-circuit condition and open-circuit conditions on crystals. The temperature transition effect during the heating and cooling processes have been taken into account in our theoretical model. We have considered two processes of the thermal fixing: one is recording at low temperature, compensating at high temperature, and then developing at low temperature, so-called the L-H-L process. The other one is recording at high temperature, and then developing at low temperature, so-called the H-L process. Our calculations show that the compensation time and temperature are two key points of thermal fixing. In order to achieve optimal diffraction efficiency for a given material parameters, we could first choose a suitable compensation time and then the corresponding compensation temperature can be obtained. On the other hand, for the H-L process, there exists an optimal recording temperature for a given material parameters. Therefore, we should first find the recording temperature, and then the corresponding recording time can be obtained. Furthermore, we have also studied the effects of material parameters and the recording angles on thermal fixing. During this investigation we have performed optical experiment. The results show a coincidence with the simulation results. Our studies provide a useful guide for designing the thermal fixing procedures of holographic storage. Ken-Yuh Hsu Arthur E. T. Chiou 許根玉 邱爾德 1999 學位論文 ; thesis 132 zh-TW |
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碩士 === 國立交通大學 === 光電工程所 === 87 === In this thesis, we investigate the thermal fixing techniques of volume holographic storage in LiNbO3 crystals. We have performed theoretical modeling, computer simulations, and optical experiments. First, we incorporate ionic transport equations into the Kukhtarev''s equations for photorefractive crystals. Then by using the linear approximation method, we have developed a theoretical model for thermal fixing under both short-circuit condition and open-circuit conditions on crystals. The temperature transition effect during the heating and cooling processes have been taken into account in our theoretical model. We have considered two processes of the thermal fixing: one is recording at low temperature, compensating at high temperature, and then developing at low temperature, so-called the L-H-L process. The other one is recording at high temperature, and then developing at low temperature, so-called the H-L process. Our calculations show that the compensation time and temperature are two key points of thermal fixing. In order to achieve optimal diffraction efficiency for a given material parameters, we could first choose a suitable compensation time and then the corresponding compensation temperature can be obtained. On the other hand, for the H-L process, there exists an optimal recording temperature for a given material parameters. Therefore, we should first find the recording temperature, and then the corresponding recording time can be obtained. Furthermore, we have also studied the effects of material parameters and the recording angles on thermal fixing. During this investigation we have performed optical experiment. The results show a coincidence with the simulation results. Our studies provide a useful guide for designing the thermal fixing procedures of holographic storage.
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Ken-Yuh Hsu |
author_facet |
Ken-Yuh Hsu Chao-Ray Hsieh 謝兆瑞 |
author |
Chao-Ray Hsieh 謝兆瑞 |
spellingShingle |
Chao-Ray Hsieh 謝兆瑞 Thermal fixing of volume holograms in LiNbO3 crystals |
author_sort |
Chao-Ray Hsieh |
title |
Thermal fixing of volume holograms in LiNbO3 crystals |
title_short |
Thermal fixing of volume holograms in LiNbO3 crystals |
title_full |
Thermal fixing of volume holograms in LiNbO3 crystals |
title_fullStr |
Thermal fixing of volume holograms in LiNbO3 crystals |
title_full_unstemmed |
Thermal fixing of volume holograms in LiNbO3 crystals |
title_sort |
thermal fixing of volume holograms in linbo3 crystals |
publishDate |
1999 |
url |
http://ndltd.ncl.edu.tw/handle/66208617464538753948 |
work_keys_str_mv |
AT chaorayhsieh thermalfixingofvolumehologramsinlinbo3crystals AT xièzhàoruì thermalfixingofvolumehologramsinlinbo3crystals AT chaorayhsieh nǐsuānlǐjīngtǐquánxiàngchǔcúnrèdìngyǐngjìshùzhīyánjiū AT xièzhàoruì nǐsuānlǐjīngtǐquánxiàngchǔcúnrèdìngyǐngjìshùzhīyánjiū |
_version_ |
1718343838294081536 |