A Study of X-ray Phase-Shifting Masks

碩士 === 國立交通大學 === 電子工程系 === 87 === In this study, we investigated the fabrication of the x-ray phase shifting masks which used the silicon rich nitride as membranes and Al, Mo, and W compound as shifters. The simulation and basic theory are discussed in this article. The silicon rich nitr...

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Bibliographic Details
Main Authors: Kai-Shyang You, 游凱翔
Other Authors: Yang-Tung Huang
Format: Others
Language:zh-TW
Published: 1999
Online Access:http://ndltd.ncl.edu.tw/handle/10006782192771809565

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