Investigation of Delta-Doped and Superlattice-Emitter Heterostructure Bipolar Transistors
博士 === 國立成功大學 === 電機工程學系 === 87 === In this dissertation, we pay attention on five delta-doped and superlattice-emitter heterostructure bipolar transistors. These novel structures included low-offset voltage high current gain In0.49Ga0.51P/GaAs delta-doped heterojunction bipolar transistor (D2HBT),...
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ndltd-TW-087NCKU04421512016-07-11T04:13:32Z http://ndltd.ncl.edu.tw/handle/64108555160704074743 Investigation of Delta-Doped and Superlattice-Emitter Heterostructure Bipolar Transistors 單原子層摻雜式與超晶格射極式異質結構雙極性電晶體之研究 Shiou-Ying Cheng 鄭岫盈 博士 國立成功大學 電機工程學系 87 In this dissertation, we pay attention on five delta-doped and superlattice-emitter heterostructure bipolar transistors. These novel structures included low-offset voltage high current gain In0.49Ga0.51P/GaAs delta-doped heterojunction bipolar transistor (D2HBT), In0.49Ga0.51P/GaAs double delta-doped heterojunction bipolar transistor (D3HBT), wide voltage operation regime In0.49Ga0.51P/GaAs double heterojunction bipolar transistor, Al0.48In0.52As/Ga0.47In0.53As superlattice-emitter resonant-tunneling bipolar transistor (SE-RTBT), and In0.49Ga0.51P/GaAs superlattice-emitter resonant-tunneling bipolar transistor (SE-RTBT) Chapter 1 is an introduction in this dissertation. For chapter 2 and 3, we investigate several key parameters to reduce the potential spike associated with conduction band discontinuity for conventional heterojunction. We demonstrate the qualitative influence of delta-doped sheet and setback layer on the performance of InGaP/GaAs heterojunction bipolar. Also, based on the theoretical analysis, the high-performance delta-doped heterojunction bipolar transistor and the improved double heterojunction bipolar transistors are fabricated and studied. These improved devices cannot only greatly reduce the magnitude of offset voltage, but also maintain relatively high emitter injection efficiency. In chapter 4, two superlattice-emitter resonant-tunneling bipolar transistor, based on AlInAs/GaInAs and InGaP/GaAs material systems, are fabricated and demonstrated. These functional structures not only significantly improve the transistor performance but also exhibit three-terminal controlled N-shaped negative-differential-resistance (NDR) characteristics. These interesting N-shaped NDR behavior are attributed primarily to RT through superlattice region. Chapter 5 is conclusion and prospect of this work. Wen-Chau Liu 劉文超 1999 學位論文 ; thesis 0 en_US |
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博士 === 國立成功大學 === 電機工程學系 === 87 === In this dissertation, we pay attention on five delta-doped and superlattice-emitter heterostructure bipolar transistors. These novel structures included low-offset voltage high current gain In0.49Ga0.51P/GaAs delta-doped heterojunction bipolar transistor (D2HBT), In0.49Ga0.51P/GaAs double delta-doped heterojunction bipolar transistor (D3HBT), wide voltage operation regime In0.49Ga0.51P/GaAs double heterojunction bipolar transistor, Al0.48In0.52As/Ga0.47In0.53As superlattice-emitter resonant-tunneling bipolar transistor (SE-RTBT), and In0.49Ga0.51P/GaAs superlattice-emitter resonant-tunneling bipolar transistor (SE-RTBT)
Chapter 1 is an introduction in this dissertation. For chapter 2 and 3, we investigate several key parameters to reduce the potential spike associated with conduction band discontinuity for conventional heterojunction. We demonstrate the qualitative influence of delta-doped sheet and setback layer on the performance of InGaP/GaAs heterojunction bipolar. Also, based on the theoretical analysis, the high-performance delta-doped heterojunction bipolar transistor and the improved double heterojunction bipolar transistors are fabricated and studied. These improved devices cannot only greatly reduce the magnitude of offset voltage, but also maintain relatively high emitter injection efficiency. In chapter 4, two superlattice-emitter resonant-tunneling bipolar transistor, based on AlInAs/GaInAs and InGaP/GaAs material systems, are fabricated and demonstrated. These functional structures not only significantly improve the transistor performance but also exhibit three-terminal controlled N-shaped negative-differential-resistance (NDR) characteristics. These interesting N-shaped NDR behavior are attributed primarily to RT through superlattice region. Chapter 5 is conclusion and prospect of this work.
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author2 |
Wen-Chau Liu |
author_facet |
Wen-Chau Liu Shiou-Ying Cheng 鄭岫盈 |
author |
Shiou-Ying Cheng 鄭岫盈 |
spellingShingle |
Shiou-Ying Cheng 鄭岫盈 Investigation of Delta-Doped and Superlattice-Emitter Heterostructure Bipolar Transistors |
author_sort |
Shiou-Ying Cheng |
title |
Investigation of Delta-Doped and Superlattice-Emitter Heterostructure Bipolar Transistors |
title_short |
Investigation of Delta-Doped and Superlattice-Emitter Heterostructure Bipolar Transistors |
title_full |
Investigation of Delta-Doped and Superlattice-Emitter Heterostructure Bipolar Transistors |
title_fullStr |
Investigation of Delta-Doped and Superlattice-Emitter Heterostructure Bipolar Transistors |
title_full_unstemmed |
Investigation of Delta-Doped and Superlattice-Emitter Heterostructure Bipolar Transistors |
title_sort |
investigation of delta-doped and superlattice-emitter heterostructure bipolar transistors |
publishDate |
1999 |
url |
http://ndltd.ncl.edu.tw/handle/64108555160704074743 |
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