Deposition of Silicon Dioxide Films by Liquid Phase Deposition Method and Its Application on Semiconductor Devices
博士 === 國立成功大學 === 電機工程學系 === 87 === A low temperature process (30~50℃) for the formation of high-quality SiO2 films using liquid phase deposition (LPD) method on the various semiconductor substrates was proposed and investigated in this thesis. It was established that good and reliable properties of...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
1999
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/18962983858200563491 |