The Study of Doped Silicon Dioxide Deposited by Liquid-Phase Deposition Method
碩士 === 國立成功大學 === 電機工程學系 === 87 === In this paper, we use a room temperature processing system, Liquid Phase Deposition (LPD) method, as theoretic background to study the doping (N, P) silicon oxide；To investigate the the properties of silicon dioxide , we have done different physical and...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1999
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| Online Access: | http://ndltd.ncl.edu.tw/handle/22928227577214162161 |