Stress Evolution of Ni/Pd/Si reaction system
碩士 === 國立中興大學 === 材料工程學研究所 === 87 === Abstract NiSi is possibly an important material for VLSI process in the future, due to its low resistivity, lower silicon consumption, and no linewidth dependence of the sheet resistance. However, NiSi is a metastable phase instead of a...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1999
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| Online Access: | http://ndltd.ncl.edu.tw/handle/48946721609516113937 |