| Summary: | 碩士 === 國立臺灣大學 === 化學系 === 86 === In this study, we have developed a chemical method to analysis the
concentration of impurities in the used gallium by inductively
coupled plasma mass spectrometry(ICP-MS). The gallium with the impurities
was digested with aqua regia. Then, the matrix(gallium ion) with
diisopropyl ether and hydrochloric acid(HCl)by shaking 5 mins, than,
got the aqueous solution and evaporated it to dryness. Finally dilute
it with HNO3/H2O and analyzed it in ICP-MS.
Moreover, we have also studied the effect of the purification power
in the used gallium by the acid leaching method. After we reused the
gallium doping Te or Zn several times, the quantity of doping element
was difficult to control. Our research applied to develop the
technology of purification gallium and built the way that
determinates the concentration of impurities in gallium.
Our research not only gave the way to determine the
concentration of impurities in gallium but also used the easier
way of acid leaching to purify gallium.
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