The Theoretical Analysis of Spin Coating Process
碩士 === 國立臺灣大學 === 化學工程學系研究所 === 86 === Spin coating is a widely used process for applying a thin uniform filmto a flat substrate or wafer disc. This technique is used in the electronics industry to coat photoresist on silicon wafers for integrated circuits,for...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1998
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| Online Access: | http://ndltd.ncl.edu.tw/handle/46815783541558073179 |