Trap Study on the Ultra Thin Oxide(4nm) Using Microwave Plasma Afterglow Oxidation at Low Temperature in Different N2O and O2 Mixtures
碩士 === 國立清華大學 === 電機工程研究所 === 86 === The ultra-thin nitrided oxide grown by microwave plasma afterglow oxidation at low temperature in the mixtures of N2O and O2 ambient has been investigated. By changing the N2O to O2 ratios in the mixtures, the optimal incorporation of nitrogen in the thin oxid...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
1998
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| Online Access: | http://ndltd.ncl.edu.tw/handle/75570647422044939249 |