Study of Metal CVD and Low-Dielectric Constant Material Hydrogen Silsesquioxane(HSQ) for ULSI Applications
碩士 === 國立清華大學 === 電機工程學研究所 === 86 === In this thesis, three major topics are studied: The first topic is the reduction of RC delay with combining low dielectric constant material such as hydrogen silsesquioxane (HSQ) and selective CVD-W HSQ maybe used as an intermetal dielectric in multilevel...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
1998
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/16409785818767678389 |