The study of copper diffusion on low k material treated by N2- plasma
碩士 === 國立清華大學 === 化學系 === 86 ===
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1998
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ndltd-TW-086NTHU00650082016-06-29T04:13:30Z http://ndltd.ncl.edu.tw/handle/31416165329386224659 The study of copper diffusion on low k material treated by N2- plasma 低介電材料之氮氣電漿表面處理及銅金屬在其中擴散機制之研究 Wu, Yi-Chin 吳宜靜 碩士 國立清華大學 化學系 86 Chang Si-Chung 張錫強 1998 學位論文 ; thesis 1 zh-TW |
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zh-TW |
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Others
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碩士 === 國立清華大學 === 化學系 === 86 ===
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author2 |
Chang Si-Chung |
author_facet |
Chang Si-Chung Wu, Yi-Chin 吳宜靜 |
author |
Wu, Yi-Chin 吳宜靜 |
spellingShingle |
Wu, Yi-Chin 吳宜靜 The study of copper diffusion on low k material treated by N2- plasma |
author_sort |
Wu, Yi-Chin |
title |
The study of copper diffusion on low k material treated by N2- plasma |
title_short |
The study of copper diffusion on low k material treated by N2- plasma |
title_full |
The study of copper diffusion on low k material treated by N2- plasma |
title_fullStr |
The study of copper diffusion on low k material treated by N2- plasma |
title_full_unstemmed |
The study of copper diffusion on low k material treated by N2- plasma |
title_sort |
study of copper diffusion on low k material treated by n2- plasma |
publishDate |
1998 |
url |
http://ndltd.ncl.edu.tw/handle/31416165329386224659 |
work_keys_str_mv |
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