The study of copper diffusion on low k material treated by N2- plasma

碩士 === 國立清華大學 === 化學系 === 86 ===

Bibliographic Details
Main Authors: Wu, Yi-Chin, 吳宜靜
Other Authors: Chang Si-Chung
Format: Others
Language:zh-TW
Published: 1998
Online Access:http://ndltd.ncl.edu.tw/handle/31416165329386224659
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spelling ndltd-TW-086NTHU00650082016-06-29T04:13:30Z http://ndltd.ncl.edu.tw/handle/31416165329386224659 The study of copper diffusion on low k material treated by N2- plasma 低介電材料之氮氣電漿表面處理及銅金屬在其中擴散機制之研究 Wu, Yi-Chin 吳宜靜 碩士 國立清華大學 化學系 86 Chang Si-Chung 張錫強 1998 學位論文 ; thesis 1 zh-TW
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language zh-TW
format Others
sources NDLTD
description 碩士 === 國立清華大學 === 化學系 === 86 ===
author2 Chang Si-Chung
author_facet Chang Si-Chung
Wu, Yi-Chin
吳宜靜
author Wu, Yi-Chin
吳宜靜
spellingShingle Wu, Yi-Chin
吳宜靜
The study of copper diffusion on low k material treated by N2- plasma
author_sort Wu, Yi-Chin
title The study of copper diffusion on low k material treated by N2- plasma
title_short The study of copper diffusion on low k material treated by N2- plasma
title_full The study of copper diffusion on low k material treated by N2- plasma
title_fullStr The study of copper diffusion on low k material treated by N2- plasma
title_full_unstemmed The study of copper diffusion on low k material treated by N2- plasma
title_sort study of copper diffusion on low k material treated by n2- plasma
publishDate 1998
url http://ndltd.ncl.edu.tw/handle/31416165329386224659
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