Low Temperature Growth of Sic Thin Films on Si by High Frequency Inductively Coupled Plasma Enhanced Chemical Vapor Deposition
碩士 === 國立中山大學 === 物理學系 === 86 === In this work, we set up an inductively-coupled-plasma-enhance-chemical-vapor-deposition system and grow SiC thin film on Si(1OO) and Si(l13) at low temperature and high frequency. The source gases were SiH4, CH4, and the gas mixed with Ar95% and H25%. The inf...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1998
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| Online Access: | http://ndltd.ncl.edu.tw/handle/93346967550492063038 |