Study on Diamond Deposition in the Etched Trenches of Si Wafer
碩士 === 國立交通大學 === 材料科學與工程學研究所 === 86 === Effects of processing parameters on diamond deposition in the etched trenches of Si wafer were studied by the Takuchi method (an orthogonal experimental analysis method). Diamond films were deposited by a microwave plasma chemical vapor deposition (MRCVD)...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1998
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| Online Access: | http://ndltd.ncl.edu.tw/handle/51405806570908058606 |