Study of Exposure Position Control of the Mask Maker for Micro- Electro-Mechnical Systems

碩士 === 國立成功大學 === 工程科學系 === 86 === This study aims to develop a low cost, practical and powerful mask writer for MEMS by the technique of CAD/CAM to generate the pattern on the mask for fabrication process of MEMS. The hardware framewo...

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Bibliographic Details
Main Authors: Pan, Huan Kuen, 潘煥
Other Authors: Y.C.Lin
Format: Others
Language:zh-TW
Published: 1998
Online Access:http://ndltd.ncl.edu.tw/handle/50704532398246318690