Study of Exposure Position Control of the Mask Maker for Micro- Electro-Mechnical Systems

• Main Authors: Pan, Huan Kuen, 潘煥
• Other Authors: Y.C.Lin
• Format: Others
• Language: zh-TW
• Published: 1998
• Online Access: http://ndltd.ncl.edu.tw/handle/50704532398246318690

碩士 === 國立成功大學 === 工程科學系 === 86 === This study aims to develop a low cost, practical and powerful mask writer for MEMS by the technique of CAD/CAM to generate the pattern on the mask for fabrication process of MEMS. The hardware framework of mask writer mainly consists of an UV optical generator and a high precision linear slide station. In addition, transformation program, which converts the mask pattern data drawn by AutoCAD, and X-Y-Θ station driving code are programmed to control the moving speed and exposure time to accurately achieve the resolution in micrometer level. In this study, collecting the data of the equipment, such as UV optical microscope, laser, linear slider station, and PMC control card, calculating the precision, describing the original design concepts and the window program,and setting the software and hardware equipment are all included. The current study completions are as the following: (1) micrometer square mask pattern, (2) micrometer circle mask pattern, (3) micrometer arc mask and so on. The original pattern data, control process, pattern track imitation, the program of transformation pattern, the actual operation, and manufacture of exposure machine will all be discussed specifically in the following text.