Synthesis and Characterization of Polymeric Deep UV Photoresists
碩士 === 國立臺灣大學 === 化學工程學研究所 === 85 === Conventional i-line photoresists used DNQ (Diazo Naphtho Quinone)/Novolac system. It can be used up to 0.35μm IC fabrication process. But for increasing the memory density in IC, this photoresists failed to be used in 0.25μm IC fabrication process because of i...
| Main Author: | |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1997
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/21195862088875633633 |