Ion beam sputted TiO2 film with dopping Si,Al,SiO2

碩士 === 國立中央大學 === 光電(科學)研究所 === 85 === Oxides of Ti was deposited by ion beam sputter deposition with a Kaufman-type ion source.The dopping Al(Si,SiO2) improved stoichiometryand surface roughness of TiO2 film. To make a weakly absorbing...

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Main Authors: Lin, Jiun Horng, 林君鴻
Other Authors: C. C. Lee
Format: Others
Language:zh-TW
Published: 1997
Online Access:http://ndltd.ncl.edu.tw/handle/29314131025327023545
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spelling ndltd-TW-085NCU001230032015-10-13T17:59:40Z http://ndltd.ncl.edu.tw/handle/29314131025327023545 Ion beam sputted TiO2 film with dopping Si,Al,SiO2 離子濺鍍混和材料光學薄膜之特性 Lin, Jiun Horng 林君鴻 碩士 國立中央大學 光電(科學)研究所 85 Oxides of Ti was deposited by ion beam sputter deposition with a Kaufman-type ion source.The dopping Al(Si,SiO2) improved stoichiometryand surface roughness of TiO2 film. To make a weakly absorbing filmof high index. C. C. Lee 李正中 1997 學位論文 ; thesis 85 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立中央大學 === 光電(科學)研究所 === 85 === Oxides of Ti was deposited by ion beam sputter deposition with a Kaufman-type ion source.The dopping Al(Si,SiO2) improved stoichiometryand surface roughness of TiO2 film. To make a weakly absorbing filmof high index.
author2 C. C. Lee
author_facet C. C. Lee
Lin, Jiun Horng
林君鴻
author Lin, Jiun Horng
林君鴻
spellingShingle Lin, Jiun Horng
林君鴻
Ion beam sputted TiO2 film with dopping Si,Al,SiO2
author_sort Lin, Jiun Horng
title Ion beam sputted TiO2 film with dopping Si,Al,SiO2
title_short Ion beam sputted TiO2 film with dopping Si,Al,SiO2
title_full Ion beam sputted TiO2 film with dopping Si,Al,SiO2
title_fullStr Ion beam sputted TiO2 film with dopping Si,Al,SiO2
title_full_unstemmed Ion beam sputted TiO2 film with dopping Si,Al,SiO2
title_sort ion beam sputted tio2 film with dopping si,al,sio2
publishDate 1997
url http://ndltd.ncl.edu.tw/handle/29314131025327023545
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