Ion beam sputted TiO2 film with dopping Si,Al,SiO2
碩士 === 國立中央大學 === 光電(科學)研究所 === 85 === Oxides of Ti was deposited by ion beam sputter deposition with a Kaufman-type ion source.The dopping Al(Si,SiO2) improved stoichiometryand surface roughness of TiO2 film. To make a weakly absorbing...
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ndltd-TW-085NCU001230032015-10-13T17:59:40Z http://ndltd.ncl.edu.tw/handle/29314131025327023545 Ion beam sputted TiO2 film with dopping Si,Al,SiO2 離子濺鍍混和材料光學薄膜之特性 Lin, Jiun Horng 林君鴻 碩士 國立中央大學 光電(科學)研究所 85 Oxides of Ti was deposited by ion beam sputter deposition with a Kaufman-type ion source.The dopping Al(Si,SiO2) improved stoichiometryand surface roughness of TiO2 film. To make a weakly absorbing filmof high index. C. C. Lee 李正中 1997 學位論文 ; thesis 85 zh-TW |
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zh-TW |
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Others
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碩士 === 國立中央大學 === 光電(科學)研究所 === 85 === Oxides of Ti was deposited by ion beam sputter deposition
with a Kaufman-type ion source.The dopping Al(Si,SiO2) improved
stoichiometryand surface roughness of TiO2 film. To make a
weakly absorbing filmof high index.
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author2 |
C. C. Lee |
author_facet |
C. C. Lee Lin, Jiun Horng 林君鴻 |
author |
Lin, Jiun Horng 林君鴻 |
spellingShingle |
Lin, Jiun Horng 林君鴻 Ion beam sputted TiO2 film with dopping Si,Al,SiO2 |
author_sort |
Lin, Jiun Horng |
title |
Ion beam sputted TiO2 film with dopping Si,Al,SiO2 |
title_short |
Ion beam sputted TiO2 film with dopping Si,Al,SiO2 |
title_full |
Ion beam sputted TiO2 film with dopping Si,Al,SiO2 |
title_fullStr |
Ion beam sputted TiO2 film with dopping Si,Al,SiO2 |
title_full_unstemmed |
Ion beam sputted TiO2 film with dopping Si,Al,SiO2 |
title_sort |
ion beam sputted tio2 film with dopping si,al,sio2 |
publishDate |
1997 |
url |
http://ndltd.ncl.edu.tw/handle/29314131025327023545 |
work_keys_str_mv |
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